Silicon grids

For applications in optics and electron optics, we fabricate very precise silicon grids.

These grids are made of silicon bars with a high aspect ratio, that can span large areas. The high aspect ratio in combination with the high modulus of elasticity of silicon enables the possibility to realize mechanically very stable grids. We fabricate the grids of mono crystalline silicon. They have no mechanical stress and are very plane therefore. Since the grids are manufactured with the help of etching processes we can produce them without burrs. In addition, we can round convex edge also by further processing, which is important when using the grid in high electric fields.

Further important properties are the chemical resistance and thus the usability for biological and medical applications, as well as high thermal stability.

Grid made of silicon (SEM image)
silicon grid, bar width 5µm (SEM image)
Grid made of silicon
silicon grid, bar width 5µm

Application:

Ideal applications for silicon grids, are ion and electron optics, X-ray optics, UV optics, and biology.

Due to the high mechanical stability of the silicon bars, energy filters can be built with very high transmission. Another important aspect for electron-optical applications is that they are free of burrs.

By an additional coating with X-ray absorbing materials scattered radiation filter can be realized.

In the field of biological applications cell strainers can be realized out of silicon grids for example.

Specifications:

  • Maximum mesh size: 100 mm
  • Minimum bar width: approx. 1µm
  • Aspect ratio of the bars: up to 15
  • Flatness: 0.3µm / mm
  • Maximum temperature: some 100°C
  • Position tolerance: < 1µm
  • Feature accuracy: ~ 1µm